CAD Design Methods for Mask Layout of Planar Light-wave Circuit Splitter

Yaohua Deng, Jie Dong, Jiandong Shi, Liming Wu, Qiaofen Zhang

Abstract


Planar Light-wave Circuit (PLC) Splitter manufacturing process is complex and sophisticated, especially the Mask layout. In this paper, according to the actual production process of PLC Splitter’s Mask layout, analyzing the key question that should be noted, and discussing the method that use the tool of AutoCAD to design PLC Splitter’s Mask. Finally, given a designing example and gotten the conclusion.


DOI
10.12783/dtetr/apetc2017/11076

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